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Tunneling Magnetoresistance (TMR) on Fe-Al2O3 Nano Granular Film Growth by Helicon Plasma Sputtering

机译:螺旋等离子体溅射在Fe-Al2O3纳米颗粒膜上的隧道磁阻(TMR)

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摘要

Fe-Al2O3 nanogranular thin film by helicon plasma sputtering with the variation of Fe content from 0.1 to 0.7 volume fraction have been prepared. The magnetic and magnetoresistance properties were investigated by a Vibrating Sample Magnetometer (VSM) and a Four Point Probe (FPP). The Rutherford BackScattering (RBS) was performed with the SIMNRA software. Conversion Electron Mossbauer Spectroscopy (CEMS) study was also performed to estimate the fraction of Fe and α-Fe2O3 in the granular film. The results suggested that the percolation concentration occured at 0.55 Fe volume fractions, with the maximum Magnetoresistance (MR) ratio of 3%. The present MR ratio that was lower than the previous results may be related to the existence of α-Fe2O3 phase.
机译:通过螺旋等离子体溅射制备了Fe含量在0.1〜0.7体积分数之间变化的Fe-Al2O3纳米颗粒薄膜。通过振动样品磁强计(VSM)和四点探针(FPP)研究了磁和磁阻特性。卢瑟福背散射(RBS)是使用SIMNRA软件执行的。还进行了转化电子Mossbauer光谱(CEMS)研究,以估计颗粒膜中Fe和α-Fe2O3的含量。结果表明,渗滤浓度出现在0.55 Fe的体积分数下,最大磁阻(MR)比为3%。当前的MR比低于以前的结果可能与α-Fe2O3相的存在有关。

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  • 作者

    Purwanto, S;

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  • 年度 2008
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  • 原文格式 PDF
  • 正文语种 EN
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